A magnetron sputtering system for the preparation of patterned thin films and in situ thin film electrical resistance measurements

U. B. Arnalds; J. S. Agustsson; A. S. Ingason; A. K. Eriksson; K. B. Gylfason; J. T. Gudmundsson; S. Olafsson

doi:10.1063/1.2793508

A magnetron sputtering system for the preparation of patterned thin films and in situ thin film electrical resistance measurements

U. B. Arnalds
, J. S. Agustsson
, A. S. Ingason
, A. K. Eriksson
, K. B. Gylfason
, J. T. Gudmundsson
, S. Olafsson

University of Iceland

Research output: Contribution to journal › Article › peer-review

Abstract

We describe a versatile three gun magnetron sputtering system with a custom made sample holder for in situ electrical resistance measurements, both during film growth and ambient changes on film electrical properties. The sample holder allows for the preparation, of patterned thin film structures, using up to five different shadow masks without breaking vacuum. We show how the system, is used to monitor the electrical resistance of thin metallic films during growth and to study the thermodynamics of hydrogen uptake in metallic thin films. Furthermore, we demonstrate the growth of thin film capacitors, where patterned films are created using shadow masks.

Original language	English
Article number	103901
Journal	Review of Scientific Instruments
Volume	78
Issue number	10
DOIs	https://doi.org/10.1063/1.2793508
Publication status	Published - 2007

Bibliographical note

Funding Information: The work was partially supported by The Icelandic Research Fund, The University of Iceland Research Fund, The Icelandic Student Innovation Fund, The Icelandic Scientific Instruments Fund, and the Steinmaur Foundation.

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10.1063/1.2793508

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title = "A magnetron sputtering system for the preparation of patterned thin films and in situ thin film electrical resistance measurements",

abstract = "We describe a versatile three gun magnetron sputtering system with a custom made sample holder for in situ electrical resistance measurements, both during film growth and ambient changes on film electrical properties. The sample holder allows for the preparation, of patterned thin film structures, using up to five different shadow masks without breaking vacuum. We show how the system, is used to monitor the electrical resistance of thin metallic films during growth and to study the thermodynamics of hydrogen uptake in metallic thin films. Furthermore, we demonstrate the growth of thin film capacitors, where patterned films are created using shadow masks.",

author = "Arnalds, \{U. B.\} and Agustsson, \{J. S.\} and Ingason, \{A. S.\} and Eriksson, \{A. K.\} and Gylfason, \{K. B.\} and Gudmundsson, \{J. T.\} and S. Olafsson",

note = "Funding Information: The work was partially supported by The Icelandic Research Fund, The University of Iceland Research Fund, The Icelandic Student Innovation Fund, The Icelandic Scientific Instruments Fund, and the Steinmaur Foundation.",

year = "2007",

doi = "10.1063/1.2793508",

language = "English",

volume = "78",

journal = "Review of Scientific Instruments",

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T1 - A magnetron sputtering system for the preparation of patterned thin films and in situ thin film electrical resistance measurements

AU - Arnalds, U. B.

AU - Agustsson, J. S.

AU - Ingason, A. S.

AU - Eriksson, A. K.

AU - Gylfason, K. B.

AU - Gudmundsson, J. T.

AU - Olafsson, S.

N1 - Funding Information: The work was partially supported by The Icelandic Research Fund, The University of Iceland Research Fund, The Icelandic Student Innovation Fund, The Icelandic Scientific Instruments Fund, and the Steinmaur Foundation.

PY - 2007

Y1 - 2007

N2 - We describe a versatile three gun magnetron sputtering system with a custom made sample holder for in situ electrical resistance measurements, both during film growth and ambient changes on film electrical properties. The sample holder allows for the preparation, of patterned thin film structures, using up to five different shadow masks without breaking vacuum. We show how the system, is used to monitor the electrical resistance of thin metallic films during growth and to study the thermodynamics of hydrogen uptake in metallic thin films. Furthermore, we demonstrate the growth of thin film capacitors, where patterned films are created using shadow masks.

AB - We describe a versatile three gun magnetron sputtering system with a custom made sample holder for in situ electrical resistance measurements, both during film growth and ambient changes on film electrical properties. The sample holder allows for the preparation, of patterned thin film structures, using up to five different shadow masks without breaking vacuum. We show how the system, is used to monitor the electrical resistance of thin metallic films during growth and to study the thermodynamics of hydrogen uptake in metallic thin films. Furthermore, we demonstrate the growth of thin film capacitors, where patterned films are created using shadow masks.

UR - https://www.scopus.com/pages/publications/36048989718

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DO - 10.1063/1.2793508

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JO - Review of Scientific Instruments

JF - Review of Scientific Instruments

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M1 - 103901

ER -

A magnetron sputtering system for the preparation of patterned thin films and in situ thin film electrical resistance measurements

Abstract

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