Doping profile recognition in silicon using terahertz time-domain spectroscopy

Chih Yu Jen, Christiaan Richter

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Here we demonstrate for the first time that terahertz time domain spectroscopy (THz-TDS) can be used to distinguish doping profile discrepancies in semiconductor silicon wafers. These proof of concept results suggest the suitability of the technique for in-line process control applications in both IC/photovoltaic (PV) industries. The experimental results show that THz radiation is sensitive to the implant dosage changes in the time domains.

Original languageEnglish
Title of host publicationTerahertz, RF, Millimeter, and Submillimeter-Wave Technology and Applications VII
PublisherSPIE
ISBN (Print)9780819498984
DOIs
Publication statusPublished - 2014
EventTerahertz, RF, Millimeter, and Submillimeter-Wave Technology and Applications VII - San Francisco, CA, United States
Duration: 4 Feb 20146 Feb 2014

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8985

Conference

ConferenceTerahertz, RF, Millimeter, and Submillimeter-Wave Technology and Applications VII
Country/TerritoryUnited States
CitySan Francisco, CA
Period4/02/146/02/14

Other keywords

  • THz-TDS
  • Terahertz
  • doping profile recognition

Fingerprint

Dive into the research topics of 'Doping profile recognition in silicon using terahertz time-domain spectroscopy'. Together they form a unique fingerprint.

Cite this