Highly ionized sputter discharges for thin film fabrication

U. Helmersson; M. Lattemann; J. Alami; J. Bohlmark; A. P. Ehiasarian; J. T. Gudmundsson

Highly ionized sputter discharges for thin film fabrication

U. Helmersson
, M. Lattemann
, J. Alami
, J. Bohlmark
, A. P. Ehiasarian
, J. T. Gudmundsson

Faculty of Physical Sciences

University of Iceland

Research output: Contribution to journal › Article › peer-review

Abstract

The different methods of obtaining the highly ionized sputter discharges for thin film fabrication are disscussed in this review. The original results of authors are presented.

Original language	English
Pages (from-to)	1421-1424
Number of pages	4
Journal	Bulletin of the Russian Academy of Sciences: Physics
Volume	70
Issue number	8
Publication status	Published - 2006

Cite this

@article{96c52f3afafb4c30ac4f05b80813e8bd,

title = "Highly ionized sputter discharges for thin film fabrication",

abstract = "The different methods of obtaining the highly ionized sputter discharges for thin film fabrication are disscussed in this review. The original results of authors are presented.",

author = "U. Helmersson and M. Lattemann and J. Alami and J. Bohlmark and Ehiasarian, \{A. P.\} and Gudmundsson, \{J. T.\}",

year = "2006",

language = "English",

volume = "70",

pages = "1421--1424",

journal = "Bulletin of the Russian Academy of Sciences: Physics",

issn = "1062-8738",

publisher = "Pleiades Publishing",

number = "8",

}

TY - JOUR

T1 - Highly ionized sputter discharges for thin film fabrication

AU - Helmersson, U.

AU - Lattemann, M.

AU - Alami, J.

AU - Bohlmark, J.

AU - Ehiasarian, A. P.

AU - Gudmundsson, J. T.

PY - 2006

Y1 - 2006

N2 - The different methods of obtaining the highly ionized sputter discharges for thin film fabrication are disscussed in this review. The original results of authors are presented.

AB - The different methods of obtaining the highly ionized sputter discharges for thin film fabrication are disscussed in this review. The original results of authors are presented.

UR - https://www.scopus.com/pages/publications/34247483140

M3 - Article

SN - 1062-8738

VL - 70

SP - 1421

EP - 1424

JO - Bulletin of the Russian Academy of Sciences: Physics

JF - Bulletin of the Russian Academy of Sciences: Physics

IS - 8

ER -

Highly ionized sputter discharges for thin film fabrication

Abstract

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