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Mössbauer study of 119Sn in 119In * implanted 3C-SiC

  • Hilary Masenda
  • , Krishanlal Bharuth-Ram
  • , Deena Naidoo
  • , Haraldur Páll Gunnlaugsson
  • , Torben Esmann Mølholt
  • , Haflidi Petur Gislason
  • , Karl Johnston
  • , Roberto Mantovan
  • , Rainer Sielemann
  • , Guido Langouche
  • , Sveinn Olafson
  • , Gerd Weyer

Research output: Contribution to journalArticlepeer-review

Abstract

119Sn Mössbauer measurements have been made on a 3C-SiC single crystal implanted with 60 keV precursor radioactive 119In * ions at ISOLDE/CERN. Spectra collected at sample temperatures of 300-670 K have been analysed in terms of two single lines and a quadrupole split doublet, which based on their isomer shifts are assigned respectively to Sn ions located on substitutional Si sites (Sn Si) and interstitial sites (Sn I) and in defect complexes near substitutional sites. The substitutional Sn Si fraction increases from 25% at room temperature to 60% at 680 K.

Original languageEnglish
Pages (from-to)71-74
Number of pages4
JournalHyperfine Interactions
Volume208
Issue number1-3
DOIs
Publication statusPublished - Mar 2012

Other keywords

  • In implantation
  • SiC
  • Sn-Mössbauer spectroscopy

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