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Oxidation induced ON1, ON2a/b defects in 4h-sic characterized by DLTS

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

The deep levels ON1 and ON2a/b introduced by oxidation into 4H-SiC are characterized via standard DLTS and via filling pulse dependent DLTS measurements. Separation of the closely spaced ON2a/b defect is achieved by using a higher resolution correlation function (Gaver-Stehfest 4) and apparent energy level, apparent electron capture cross section and filling pulse measurement derived capture cross sections are given.

Original languageEnglish
Title of host publicationSilicon Carbide and Related Materials 2013
EditorsHajime Okumura, Hiroshi Harima, Tsunenobu Kimoto, Masahiro Yoshimoto, Heiji Watanabe, Tomoaki Hatayama, Hideharu Matsuura, Yasuhisa Sano, Tsuyoshi Funaki
PublisherTrans Tech Publications Ltd
Pages281-284
Number of pages4
ISBN (Print)9783038350101
DOIs
Publication statusPublished - 2014
Event15th International Conference on Silicon Carbide and Related Materials, ICSCRM 2013 - Miyazaki, Japan
Duration: 29 Sept 20134 Oct 2013

Publication series

NameMaterials Science Forum
Volume778-780

Conference

Conference15th International Conference on Silicon Carbide and Related Materials, ICSCRM 2013
Country/TerritoryJapan
CityMiyazaki
Period29/09/134/10/13

Other keywords

  • 4H-SiC
  • Capture cross section
  • Carrier lifetime
  • DLTS
  • Deep level
  • Defect
  • Oxidation
  • Trap

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