Abstract
We report on electroluminescence at room temperature from n+-p silicon diodes containing high densities (108-109 cm-2) of dislocations at the junction interface. In addition to the electroluminescence (EL) from band-to-band transitions we observe a signal with a comparable intensity peaked at ∼1.6 μm (0.78 eV). From studies of the luminescence below room temperature, we deduce that the 1.6 μm emission originates from the well known dislocation-related center D1. The D1 electroluminescence intensity at 300 K increases linearly with current density with no observable saturation. The external quantum efficiency of the D1 electroluminescence at room temperature was estimated to be of the order of 10-7.
| Original language | English |
|---|---|
| Pages (from-to) | 201-203 |
| Number of pages | 3 |
| Journal | Thin Solid Films |
| Volume | 294 |
| Issue number | 1-2 |
| DOIs | |
| Publication status | Published - 15 Feb 1997 |
Bibliographical note
Funding Information: We thank H.J. Queisser for his interest and support of this work and W. Heinz and W. Krause for technical assistance. We thank B. Winter and R. Brendel for phosphorus diffusions. Part of this work was financially supported by Chalmers University of Technology, Göteborg, Sweden.Other keywords
- Dislocations
- Electroluminescence