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Thickness-dependent magnetic and magnetoresistance properties of permalloy prepared by field assisted tilt sputtering

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Abstract

This paper presents magnetic and anisotropic magnetoresistance (AMR) results of permalloy Ni80Fe20 films of different thickness (10-250 nm). The films were grown by sputter deposition at an angle, with in-situ magnetic field assisting the definition of uniaxial anisotropy. The results show that there is negligible change in anisotropy field (Hk) and resistivity with thickness down to 50 nm. However, for thinner films (<50 nm) Hk and resistivity increase rapidly with decrease in film thickness. The coercivity (Hc) of our films was found to be independent of the thickness, in all cases below 1.5 Oe. The AMR increases with the film thickness and saturates at higher thicknesses.

Original languageEnglish
Title of host publicationSAS 2017 - 2017 IEEE Sensors Applications Symposium, Proceedings
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781509032020
DOIs
Publication statusPublished - 6 Apr 2017
Event12th IEEE Sensors Applications Symposium, SAS 2017 - Glassboro, United States
Duration: 13 Mar 201715 Mar 2017

Publication series

NameSAS 2017 - 2017 IEEE Sensors Applications Symposium, Proceedings

Conference

Conference12th IEEE Sensors Applications Symposium, SAS 2017
Country/TerritoryUnited States
CityGlassboro
Period13/03/1715/03/17

Bibliographical note

Publisher Copyright: © 2017 IEEE.

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