Highly ionized sputter discharges for thin film fabrication

U. Helmersson; M. Lattemann; J. Alami; J. Bohlmark; A. P. Ehiasarian; J. T. Gudmundsson

Highly ionized sputter discharges for thin film fabrication

U. Helmersson
, M. Lattemann
, J. Alami
, J. Bohlmark
, A. P. Ehiasarian
, J. T. Gudmundsson

Raunvísindadeild

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Rannsóknarafurð: Framlag til fræðitímarits › Grein › ritrýni

Útdráttur

The different methods of obtaining the highly ionized sputter discharges for thin film fabrication are disscussed in this review. The original results of authors are presented.

Upprunalegt tungumál	Enska
Síður (frá-til)	1421-1424
Síðufjöldi	4
Fræðitímarit	Bulletin of the Russian Academy of Sciences: Physics
Bindi	70
Númer tölublaðs	8
Útgáfustaða	Útgefið - 2006

Vitna í þetta

@article{96c52f3afafb4c30ac4f05b80813e8bd,

title = "Highly ionized sputter discharges for thin film fabrication",

abstract = "The different methods of obtaining the highly ionized sputter discharges for thin film fabrication are disscussed in this review. The original results of authors are presented.",

author = "U. Helmersson and M. Lattemann and J. Alami and J. Bohlmark and Ehiasarian, \{A. P.\} and Gudmundsson, \{J. T.\}",

year = "2006",

language = "English",

volume = "70",

pages = "1421--1424",

journal = "Bulletin of the Russian Academy of Sciences: Physics",

issn = "1062-8738",

publisher = "Pleiades Publishing",

number = "8",

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TY - JOUR

T1 - Highly ionized sputter discharges for thin film fabrication

AU - Helmersson, U.

AU - Lattemann, M.

AU - Alami, J.

AU - Bohlmark, J.

AU - Ehiasarian, A. P.

AU - Gudmundsson, J. T.

PY - 2006

Y1 - 2006

N2 - The different methods of obtaining the highly ionized sputter discharges for thin film fabrication are disscussed in this review. The original results of authors are presented.

AB - The different methods of obtaining the highly ionized sputter discharges for thin film fabrication are disscussed in this review. The original results of authors are presented.

UR - https://www.scopus.com/pages/publications/34247483140

M3 - Article

SN - 1062-8738

VL - 70

SP - 1421

EP - 1424

JO - Bulletin of the Russian Academy of Sciences: Physics

JF - Bulletin of the Russian Academy of Sciences: Physics

IS - 8

ER -

Highly ionized sputter discharges for thin film fabrication

Útdráttur

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